Ion energy distribution functions in inductively coupled RF discharges in mixtures of chlorine and boron trichloride

Technical Report · Fri Jan 31 23:00:00 EST 1997

DOI:https://doi.org/10.2172/463640· OSTI ID:463640

Woodworth, J R; Nichols, C A ^[1]; Hamilton, T W ^[2]

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1. Sandia National Labs., Albuquerque, NM (United States). Laser, Optics, and Remote Sensing Dept.
2. Applied Physics International, Inc., Albuquerque, NM (United States)

Plasma discharges involving mixtures of chlorine and boron trichloride are widely used to etch metals in the production of very-large-scale-integrated circuits. Energetic ions play a critical role in this process, influencing the etch rates, etch profiles, and selectivity to different materials. The authors are using a gridded energy analyzer to measure positive ion energy distributions and fluxes at the grounded electrode of high-density inductively-coupled rf discharges. In this paper, they present details of ion energies and fluxes in discharges containing mixtures of chlorine and boron trichloride.

• Research Organization: Sandia National Labs., Albuquerque, NM (United States)
• Sponsoring Organization: USDOE, Washington, DC (United States)
• DOE Contract Number: AC04-94AL85000
• OSTI ID: 463640
• Report Number(s): SAND--97-0219C; CONF-970575--1; ON: DE97002540
• Country of Publication: United States
• Language: English

Related Subjects

42 ENGINEERING
BORON CHLORIDES
CATIONS
CHLORINE
ENERGY SPECTRA
ETCHING
EXPERIMENTAL DATA
HIGH-FREQUENCY DISCHARGES
INTEGRATED CIRCUITS