Relative atomic chlorine density in inductively coupled chlorine plasmas
- Sandia National Laboratories, Albuquerque, New Mexico 87185-1423 (United States)
Atomic chlorine is an important chemical species in plasma processing of silicon and III{endash}V compound semiconductors. Two-photon laser-induced fluorescence (LIF) has been used to measure the relative atomic chlorine density in an inductively driven, rf discharge in chlorine gas. The Cl density in the center of the discharge was independent of rf power in the range of 150{endash}400 W and increased a factor of 2 when the pressure was increased from 15 to 50 mTorr. LIF measurements performed on both levels of the chlorine spin-split ground state indicate similar trends for both energy levels in the inductive plasma mode. {copyright} {ital 1997 American Institute of Physics.}
- Research Organization:
- Sandia National Laboratory
- DOE Contract Number:
- AC04-94AL85000
- OSTI ID:
- 463439
- Journal Information:
- Journal of Applied Physics, Journal Name: Journal of Applied Physics Journal Issue: 2 Vol. 81; ISSN JAPIAU; ISSN 0021-8979
- Country of Publication:
- United States
- Language:
- English
Similar Records
Relative atomic chlorine density in inductively coupled plasmas containing chlorine and boron trichloride
Ion distribution functions in inductively coupled radio frequency discharges in argon{endash}chlorine mixtures
Characterization of pulse-modulated inductively coupled plasmas in argon and chlorine
Journal Article
·
Fri May 01 00:00:00 EDT 1998
· Journal of Applied Physics
·
OSTI ID:603117
Ion distribution functions in inductively coupled radio frequency discharges in argon{endash}chlorine mixtures
Journal Article
·
Fri Oct 31 23:00:00 EST 1997
· Journal of Vacuum Science and Technology, A
·
OSTI ID:552991
Characterization of pulse-modulated inductively coupled plasmas in argon and chlorine
Journal Article
·
Mon Sep 01 00:00:00 EDT 1997
· Journal of Applied Physics
·
OSTI ID:542151