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Title: High performance capacitors using nano-structure multilayer materials fabrication

Patent ·
OSTI ID:46286

A high performance capacitor is fabricated from nano-structure multilayer materials, such as by controlled, reactive sputtering, and having very high energy-density, high specific energy and high voltage breakdown. The multilayer capacitors, for example, may be fabricated in a ``notepad`` configuration composed of 200-300 alternating layers of conductive and dielectric materials so as to have a thickness of 1 mm, width of 200 mm, and length of 300 mm, with terminals at each end of the layers suitable for brazing, thereby guaranteeing low contact resistance and high durability. The notepad capacitors may be stacked in single or multiple rows (series-parallel banks) to increase the voltage and energy density. 5 figs.

Research Organization:
Univ. of California (United States)
DOE Contract Number:
W-7405-ENG-48
Assignee:
Univ. of California, Oakland, CA (United States)
Patent Number(s):
US 5,414,588/A/
Application Number:
PAN: 8-122,940
OSTI ID:
46286
Resource Relation:
Other Information: PBD: 9 May 1995
Country of Publication:
United States
Language:
English