High performance capacitors using nano-structure multilayer materials fabrication
A high performance capacitor is described which is fabricated from nano-structure multilayer materials, such as by controlled, reactive sputtering, and having very high energy-density, high specific energy and high voltage breakdown. The multilayer capacitors, for example, may be fabricated in a ``notepad`` configuration composed of 200--300 alternating layers of conductive and dielectric materials so as to have a thickness of 1 mm, width of 200 mm, and length of 300 mm, with terminals at each end of the layers suitable for brazing, thereby guaranteeing low contact resistance and high durability. The ``notepad`` capacitors may be stacked in single or multiple rows (series-parallel banks) to increase the voltage and energy density. 5 figs.
- Research Organization:
- Univ. of California (United States)
- DOE Contract Number:
- W-7405-ENG-48
- Assignee:
- Univ. of California, Oakland, CA (United States)
- Patent Number(s):
- US 5,486,277/A/
- Application Number:
- PAN: 8-384,096
- OSTI ID:
- 187065
- Resource Relation:
- Other Information: PBD: 23 Jan 1996
- Country of Publication:
- United States
- Language:
- English
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High performance capacitors using nano-structure multilayer materials fabrication
High performance capacitors using nano-structure multilayer materials fabrication