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Synthesis of mullite coatings by chemical vapor deposition

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Formation of mullite on ceramic substrates via chemical vapor deposition was investigated. Mullite is a solid solution of Al{sub 2}O{sub 3} and SiO{sub 2} with a composition of 3Al{sub 2}O{sub 3}{circ}2SiO{sub 2}. Thermodynamic calculations performed on the AlCl{sub 3}-SiCl{sub 4}-CO{sub 2}-H{sub 2} system were used to construct equilibrium CVD phase diagrams. With the aid of these diagrams and consideration of kinetic rate limiting factors, initial process parameters were determined. Through process optimization, crystalline CVD mullite coatings have been successfully grown on SiC and Si{sub 3}N{sub 4} substrates. Results from the thermodynamic analysis, process optimization, and effect of various process parameters on deposition rate and coating morphology are discussed.

Research Organization:
Oak Ridge National Lab., TN (United States)
DOE Contract Number:
AC05-84OR21400
OSTI ID:
458939
Report Number(s):
ORNL/FMP--96/1; CONF-9605167--; ON: DE97050349; CNN: Contract SC-19X-SS110C
Country of Publication:
United States
Language:
English

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