Skip to main content
U.S. Department of Energy
Office of Scientific and Technical Information

Identification of electron-irradiation defects in semi-insulating GaAs by normalized thermally stimulated current measurements

Journal Article · · Physical Review, B: Condensed Matter
; ; ;  [1]
  1. Physics Department, Wright State University, Dayton, Ohio 45435 (United States)
Primary defects induced by 1 MeV electron irradiation have been quantitatively studied in semi-insulating (SI) GaAs by using normalized thermally stimulated current spectroscopy, a new technique. Defects identical to (or similar to) those known in the thermally stimulated current literature as T{sub 6}{sup {asterisk}}(0.13 eV), T{sub 5}(0.34 eV), and T{sub 4}(0.31 eV) are produced at rates 0.70, 0.08, and 0.23 cm{sup {minus}1}, respectively; T{sub 5} is also a strong trap in unirradiated SI GaAs. The defects T{sub 6}{sup {asterisk}} and T{sub 4} correspond closely to the irradiation-induced traps E2(0.14 eV) and E3(0.30 eV), studied extensively by deep-level transient spectroscopy and Hall-effect measurements and assigned to the As vacancy. We thus infer that traps T{sub 6}{sup {asterisk}} and T{sub 4} (and probably also T{sub 5}) in SI GaAs have As-vacancy character. {copyright} {ital 1997} {ital The American Physical Society}
OSTI ID:
450341
Journal Information:
Physical Review, B: Condensed Matter, Journal Name: Physical Review, B: Condensed Matter Journal Issue: 4 Vol. 55; ISSN 0163-1829; ISSN PRBMDO
Country of Publication:
United States
Language:
English

Similar Records

Defect states in ZnSe single crystals irradiated with gamma rays
Journal Article · Mon Dec 31 23:00:00 EST 1990 · Journal of Applied Physics; (USA) · OSTI ID:5997069

Ar plasma induced deep levels in epitaxial n-GaAs
Journal Article · Sat Dec 31 23:00:00 EST 2011 · Journal of Applied Physics · OSTI ID:22038836

Deep level defects in proton radiated GaAs grown on metamorphic SiGe/Si substrates
Journal Article · Tue Aug 01 00:00:00 EDT 2006 · Journal of Applied Physics · OSTI ID:20879997