Phase-shifting point diffraction interferometer

Journal Article · Tue Oct 01 00:00:00 EDT 1996 · Optics Letters

DOI:https://doi.org/10.1364/OL.21.001526· OSTI ID:434724

Medecki, H ^[1]; Tejnil, E ^[2]; Goldberg, K A ^[1]; Bokor, J ^[1]

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1. Center for X-Ray Optics, Lawrence Berkeley National Laboratory, Berkeley, California 94720 (United States)
2. Department of Electrical Engineering and Computer Sciences, University of California, Berkeley, Berkeley, California 94720 (United States)

We describe a novel interferometer design suitable for highly accurate measurement of wave-front aberrations over a wide range of wavelengths, from visible to x ray. The new design, based on the point diffraction interferometer, preserves the advantages of the conventional point diffraction interferometer but offers higher efficiency and improved accuracy through phase shifting. These qualities make it applicable to at-wavelength testing of many optical systems, including short-wavelength projection lithography optics. A visible-light prototype was built and operated. {copyright} {ital 1996 Optical Society of America.}

• Sponsoring Organization: USDOE
• OSTI ID: 434724
• Journal Information: Optics Letters, Journal Name: Optics Letters Journal Issue: 19 Vol. 21; ISSN OPLEDP; ISSN 0146-9592
• Country of Publication: United States
• Language: English

Related Subjects

44 INSTRUMENTATION
INCLUDING NUCLEAR AND PARTICLE DETECTORS
DESIGN
EXTREME ULTRAVIOLET RADIATION
INTERFEROMETERS
PHASE SHIFT
VISIBLE RADIATION