A NEW TECHNIQUE FOR POLISHING AND ETCHING ZIRCALOY II AND U-Zr ALLOYS
An investigation was made of polishing and etching Zircaloy II and U-Zr alloys by automatic sanding and an etch-polish to obtain a highly polished surface. A micro-finish has to be obtained in order to use the etchant developed (30cc HNO/sub 3/, 3ccHF, 30cc Lactic acid). Clearer structural definition of U- Zr alloy results from the use of this etchant. Etch pits which are commonly observed in Zircaloy II and U-Zr alloys are also considerably reduced. (auth)
- Research Organization:
- Knolls Atomic Power Lab., Schenectady, N.Y.
- DOE Contract Number:
- W-31-109-ENG-52
- NSA Number:
- NSA-12-010610
- OSTI ID:
- 4324016
- Report Number(s):
- KAPL-M-KM-1
- Country of Publication:
- United States
- Language:
- English
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