Oxidation of refractory compounds. II (in Russian)
Journal Article
·
· Porosh. Met., Akad. Nauk Ukr. SSR, no. 2, pp. 43-49
OSTI ID:4310056
High-temperature oxidation of VSi/sub 2/, NbSi/sub 2/, and TiSi/sub 2/ was studied in the temperature range of 500 to 1200 deg C in air. The formation of multilayer multiphase scales consisting of silicon oxides, lower metal silicides, metal oxides, gaseous SiO, and corresponding metal nitrides is established to be a peculiar feature for the oxidation process of the V group metal disilicides. (auth)
- Research Organization:
- Inst. of Problems in Materials Science, Kiev
- NSA Number:
- NSA-29-029973
- OSTI ID:
- 4310056
- Journal Information:
- Porosh. Met., Akad. Nauk Ukr. SSR, no. 2, pp. 43-49, Journal Name: Porosh. Met., Akad. Nauk Ukr. SSR, no. 2, pp. 43-49; ISSN PMANA
- Country of Publication:
- Country unknown/Code not available
- Language:
- Russian
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