BRIGHT-FIELD ETCHES FOR THE METALLOGRAPHY OF URANIUM
Technical Report
·
OSTI ID:4306321
With the standard solution of 8 parts ethyl alcohol, 5 parts phosphoric acid, and 5 parts ethylene glycol, two basic etching procedures were developed for producing a bright-field etch. One of these procedures produces a differential coloration of the uranium grains which is suitable for examination and photomicrography. This procedure involves oxidation of the prepared surface at room temperature fer about 20 hours. The other procedure places the detail of the uranium microstructure in relief so it may be observed and photographed using oblique light. This procedure requires an alternating etching and polishing technique. (auth)
- Research Organization:
- General Electric Co. Hanford Atomic Products Operation, Richland, Wash.
- DOE Contract Number:
- W-31-109-ENG-52
- NSA Number:
- NSA-13-003816
- OSTI ID:
- 4306321
- Report Number(s):
- HW-57663
- Country of Publication:
- United States
- Language:
- English
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