Modeling and simulation of a large area plasma source
- Pohang Univ. of Science and Technology (Korea, Republic of)
- Univ. of California, Berkeley, CA (United States)
- Dong-A Univ., Pusan (Korea, Republic of)
A very large area, rf inductively driven plasma source is designed and analyzed by modeling and a 2-D fluid simulation. As the dimension of the antenna coil of an rf-powered plasma system is increased to become comparable to the rf wavelength, the non-uniformity of the plasma source due to standing waves becomes an important obstacle to overcome. A novel TCP/ICP plasma source launching a traveling wave is being developed at UC Berkeley for processing a large flat area (wafer of 30 cm diameter or 36 by 46.5 cm flat panel) with relatively uniform plasma densities. The experimental design of the large area plasma source will be presented along with simple modeling and initial experimental results. The simple modeling analysis for calculating the non-uniformity for a planar array of eight line sources reveals that an optimum ratio of the width to depth dimensions exists to minimize the non-uniformity to less than 5% for the above source and substrate dimensions and for neutral gas pressures ranging from 10 to 100 mTorr.
- Sponsoring Organization:
- National Science Foundation, Washington, DC (United States); Lawrence Livermore National Lab., CA (United States)
- DOE Contract Number:
- FG03-87ER13727; W-7405-ENG-48
- OSTI ID:
- 419672
- Report Number(s):
- CONF-960634--
- Country of Publication:
- United States
- Language:
- English
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