Interaction of Si and Al during interdiffusion in Ni-Al-Si alloys
- Argonne National Lab., IL (United States)
- Univ. of Illinois, Urbana, IL (United States). Dept. of Materials Science and Engineering
Binary and ternary Ni-base alloys are often used as model alloys to study phenomena that occur in complex, multi-component Ni-base superalloys. Ni-Si, Ni-Al, Ni-Al-Mo, Ni-Cr-Si, Ni-Al-Ti and more recently Ni-Al-Si systems have been used to study coarsening of {gamma}{prime} L1{sub 2}-type precipitates in Ni-base alloys. One material parameter that is required to comparison of experimental results with theoretical predictions is the interdiffusion coefficient in the case of binary system and the matrix of interdiffusion coefficients in the case of ternary systems. Although some data are available for binary systems, very little information is available on diffusivities in the ternary systems. The current study was specifically initiated to obtain diffusion data in the {gamma}-phase (ternary solid solution Ni(Al, Si)) in the Ni-Al-Si system and to compare this with the diffusion data obtained from the individual binary systems. The interdiffusion coefficients obtained from the binary systems were compared to the effective interdiffusion coefficients obtained in the ternary systems. To facilitate the comparison, the interdiffusion coefficients in the ternary system were obtained along a constant Ni-line in the isotherm and hence only the relative amounts of Si and Al varied along the diffusion path.
- Research Organization:
- Argonne National Laboratory (ANL), Argonne, IL
- DOE Contract Number:
- W-31109-ENG-38; FG02-91ER45439
- OSTI ID:
- 417906
- Journal Information:
- Scripta Materialia, Journal Name: Scripta Materialia Journal Issue: 2 Vol. 36; ISSN 1359-6462; ISSN SCMAF7
- Country of Publication:
- United States
- Language:
- English
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