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U.S. Department of Energy
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THERMALLY STABLE SILICON-CONTAINING RESINS FOR DIELECTRIC APPLICATIONS. Quarterly Progress Report No. 1 for December 1, 1959-February 29, 1960

Technical Report ·
OSTI ID:4172647
Dichelates formed from titanium esters and acetylacetone were found to undergo liquid-phase thermal decomposition at 130 to 170 deg C with the destruction of the chelate ring and the formation of an organic ester. Dichelates prepared frorri titanium esters and 8-quinolinol reacted with acetoxysilanes to yield near quantitative amounts of the expected organic ester. Hexamethyldisiloxane did not react with either bis(2-oxy-2-pentene-4-one) titanium oxide or isopropoxide. There is evidence that the isopropoxide and trimethylethoxysilane form a siloxytitaneThe procedure of ester elimination for the formation of siloxanes appeared to be analogous to the well-known alkyl halide method. Considerable redistribution occured and only the siloxanes derived from the monofunctional silicon compounds present were obtained in good yields. p-Phenylenebis (diethoxymethylsilane) and glacial acetic acid did riot give the siloxane polyol as previously reported. When other experimental monomers were hydrolyzed with aqueous hydrochloric acid, only p-phenylenebis (diethoxyp-dimethylaminophenyisilane) showed significant carbon-silicon cleavage. (See also NP-8018.) (auth)
Research Organization:
Midwest Research Inst., Kansas City, Mo.
NSA Number:
NSA-14-013715
OSTI ID:
4172647
Report Number(s):
NP-8650
Country of Publication:
United States
Language:
English