Skip to main content
U.S. Department of Energy
Office of Scientific and Technical Information

DISSOLUTION KINETICS AT DISLOCATION ETCH PITS IN SINGLE CRYSTALS OF LITHIUM FLUORIDE. Technical Report No. 4

Technical Report ·
OSTI ID:4169578

The dissolution kinetics, at dislocation sites, of lithium fluoride in water was studied as a function of time, temperature, unsaturation, and inhibitor concentration. The ledge theories are reviewed, and the experimental results on etch pit formation in lithium fluoride crystals are compared with the predictions of the theories. The etch pits were produced at dislocation-surface intersections on the {100} faces of lithium fluoride with an etchant consisting of a dilute solution of ferric fluoride in distilled water. Good agreement was obtained between experimental results and theoretical predictions with the exception of the dependence of pit slope on undersaturation. The concept of a timedependence in the kinetics of dissolving crystal ledges is used to reconcile the above exception with the theoretical predictions and to explain the inapplicability of the topographical theory in the case of dislocation etch pits. Results indicate that the onset of multilayer adsorption at the ledges of lithium fluoride occur for ferric ion concentrations of 5 to 10 ppm. The pit width rate variation as a function of lithium fluoride concentration is discussed. (C.J.G.)

Research Organization:
Carnegie Inst. of Tech., Pittsburgh. Metals Research Lab.
NSA Number:
NSA-14-008400
OSTI ID:
4169578
Report Number(s):
NP-8351
Country of Publication:
United States
Language:
English

Similar Records

DISLOCATION ETCH PIT FORMATION IN LITHIUM FLUORIDE
Journal Article · Thu May 01 00:00:00 EDT 1958 · Journal of Applied Physics (U.S.) · OSTI ID:4324826

ORIENTATION-DEPENDENT DISSOLUTION OF LITHIUM FLUORIDE
Journal Article · Tue Aug 01 00:00:00 EDT 1961 · Journal of Applied Physics (U.S.) · OSTI ID:4838560

ETCH PITS AT DISLOCATIONS IN COPPER
Journal Article · Tue Jan 31 23:00:00 EST 1961 · Journal of Applied Physics (U.S.) · OSTI ID:4078531