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SEPARATION OF HAFNIUM FROM ZIRCONIUM

Patent ·
OSTI ID:4164766
The separation of hafnium impurities from zirconium can be accomplished by means of organic solvent extraction. The hafnium-containing zirconium feed material is dissolved in an aqueous chloride solution and the resulting solution is contacted with an organic hexone phase, with at least one of the phases containing thiocyanate. The hafnium is extracted into the organic phase while zirconium remains in the aqueous phase. Further recovery of zirconium is effected by stripping the onganic phase with a hydrochloric acid solution and commingling the resulting strip solution with the aqueous feed solution. Hexone is recovered and recycled by means of scrubbing the onganic phase with a sulfuric acid solution to remove the hafnium, and thiocyanate is recovered and recycled by means of neutralizing the effluent streams to obtain ammonium thiocyanate.
Research Organization:
Originating Research Org. not identified
NSA Number:
NSA-14-021621
Assignee:
U.S. Atomic Energy Commission
Patent Number(s):
US 2938769
OSTI ID:
4164766
Country of Publication:
United States
Language:
English

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