skip to main content
OSTI.GOV title logo U.S. Department of Energy
Office of Scientific and Technical Information

Title: Large area, surface discharge pumped, vacuum ultraviolet light source

Abstract

Large area, surface discharge pumped, vacuum ultraviolet (VUV) light source is disclosed. A contamination-free VUV light source having a 225 cm{sup 2} emission area in the 240-340 nm region of the electromagnetic spectrum with an average output power in this band of about 2 J/cm{sup 2} at a wall-plug efficiency of approximately 5% is described. Only ceramics and metal parts are employed in this surface discharge source. Because of the contamination-free, high photon energy and flux, and short pulse characteristics of the source, it is suitable for semiconductor and flat panel display material processing. 3 figs.

Inventors:
;
Publication Date:
Research Org.:
University of California
OSTI Identifier:
415764
Patent Number(s):
US 5,585,641/A/
Application Number:
PAN: 8-448,242
Assignee:
Univ. of California, Alameda, CA (United States) PTO; SCA: 360601; 426000; PA: EDB-97:015374; SN: 97001714605
DOE Contract Number:  
W-7405-ENG-36
Resource Type:
Patent
Resource Relation:
Other Information: PBD: 17 Dec 1996
Country of Publication:
United States
Language:
English
Subject:
36 MATERIALS SCIENCE; 42 ENGINEERING NOT INCLUDED IN OTHER CATEGORIES; LIGHT SOURCES; DESIGN; SEMICONDUCTOR MATERIALS; MANUFACTURING; DISPLAY DEVICES; FAR ULTRAVIOLET RADIATION; INDUSTRIAL PLANTS

Citation Formats

Sze, R.C., and Quigley, G.P. Large area, surface discharge pumped, vacuum ultraviolet light source. United States: N. p., 1996. Web.
Sze, R.C., & Quigley, G.P. Large area, surface discharge pumped, vacuum ultraviolet light source. United States.
Sze, R.C., and Quigley, G.P. Tue . "Large area, surface discharge pumped, vacuum ultraviolet light source". United States.
@article{osti_415764,
title = {Large area, surface discharge pumped, vacuum ultraviolet light source},
author = {Sze, R.C. and Quigley, G.P.},
abstractNote = {Large area, surface discharge pumped, vacuum ultraviolet (VUV) light source is disclosed. A contamination-free VUV light source having a 225 cm{sup 2} emission area in the 240-340 nm region of the electromagnetic spectrum with an average output power in this band of about 2 J/cm{sup 2} at a wall-plug efficiency of approximately 5% is described. Only ceramics and metal parts are employed in this surface discharge source. Because of the contamination-free, high photon energy and flux, and short pulse characteristics of the source, it is suitable for semiconductor and flat panel display material processing. 3 figs.},
doi = {},
journal = {},
number = ,
volume = ,
place = {United States},
year = {1996},
month = {12}
}