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Means for obtaining a metal ion beam from a heavy-ion cyclotron source

Patent ·
OSTI ID:4124008

A description is given of a modification to a cyclotron ion source used in producing a high intensity metal ion beam. A small amount of an inert support gas maintains the usual plasma arc, except that it is necessary for the support gas to have a heavy mass, e.g., xenon or krypton as opposed to neon. A plate, fabricated from the metal (or anything that can be sputtered) to be ionized, is mounted on the back wall of the ion source arc chamber and is bombarded by returning energetic low-charged gas ions that fail to cross the initial accelerating gap between the ion source and the accelerating electrode. Some of the atoms that are dislodged from the plate by the returning gas ions become ionized and are extracted as a useful beam of heavy ions. (auth)

Research Organization:
Originating Research Org. not identified
NSA Number:
NSA-33-009971
Assignee:
to U.S. Energy Research and Development Administration
Patent Number(s):
PAT-APPL-497,176.; US 3898496
OSTI ID:
4124008
Country of Publication:
United States
Language:
English

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