Thermal decomposition of gaseous metal fluorides on metals

Conference · Wed Jan 01 04:00:00 EST 1975

OSTI ID:4100942

Dejachy, G; Gillardeau, J; Rigny, P; Oudar, J; Blocher, Jr, J M; Hintermann, H E; Hall, L H ^[1]

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1. eds.

The growth of copper crystals on copper, by thermal decomposition of CuF$sub 2$, has been studied previously. It has been observed that, at a given temperature, the deposition rate reaches a maximum value which seems to be controlled only by the desorption of fluorine from a complete monolayer.Recent results concerning the thermal decomposition of TiF$sub 4$ and Ti and FeF$sub 2$ on Fe confirm this mechanism and give a measure of the heat of desorption of fluorine. The deposition rate can be generally improved if one uses the thermal decomposition of subfluorides. A method was developed based on sub-fluoride preparation in situ near the substrate. According to this new method, the formation of the sub-fluoride and its thermal decomposition occur simultaneously. This process is very suitable for the deposition of refractory metals at relatively low temperatures. Some examples are given, concerning mainly the decomposition of WF$sub 5$. Generally, in comparison with other halides, it seems that the thermal decomposition of fluorides is preferable for obtaining very high quality deposits, provided the technology necessary for fluorine chemistry is available. (auth)

• Research Organization: CEN, Saclay, France
• NSA Number: NSA-33-015249
• OSTI ID: 4100942
• Country of Publication: United States
• Language: English

Related Subjects

*COPPER FLUORIDES-- DECOMPOSITION
*COPPER-- CHEMICAL VAPOR DEPOSITION
*TITANIUM FLUORIDES-- DECOMPOSITION
*TITANIUM-- CHEMICAL VAPOR DEPOSITION
*TUNGSTEN-- CHEMICAL VAPOR DEPOSITION
360101* --Materials--Metals & Alloys--Preparation & Fabrication
FLUORIDES
N50220* --Metals
Ceramics
& Other Materials--Metals & Alloys--Preparation & Fabrication