Temperature and orientation dependence of kinetic roughening during homoepitaxy: A quantitative x-ray-scattering study of Ag
- Department of Physics and Astronomy, University of Missouri--Columbia, Columbia, Missouri 65211 (United States)
- Department of Physics, State University of New York, Stony Brook, New York 11794 (United States)
Kinetic roughening during homoepitaxial growth was studied for Ag(111) and Ag(001). For Ag(111), from 150 to 500 K, the rms roughness exhibits a power law, {sigma}{proportional_to}{ital t}{sup {beta}} over nearly three decades in thickness. {beta}{approx_equal}1/2 at low temperatures, and there is an abrupt transition to smaller values above 300 K. In contrast, Ag(001) exhibits layer-by-layer growth with a significantly smaller {beta}. These results are the first to establish the evolution of surface roughness quantitatively for a broad thickness and temperature range, as well as for the case where growth kinetics are dominated by a step-ledge diffusion barrier. {copyright} {ital 1996 The American Physical Society.}
- DOE Contract Number:
- FG02-86ER45231; FG02-90ER45427
- OSTI ID:
- 409799
- Journal Information:
- Physical Review, B: Condensed Matter, Journal Name: Physical Review, B: Condensed Matter Journal Issue: 24 Vol. 54; ISSN 0163-1829; ISSN PRBMDO
- Country of Publication:
- United States
- Language:
- English
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