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FISSION FRAGMENT DAMAGE IN NONFISSIONABLE THIN FILMS

Journal Article · · Journal of Applied Physics (U.S.)
DOI:https://doi.org/10.1063/1.1735545· OSTI ID:4097405
Fission fragment damage in thin films of nonfissionable materials was studied using Qansmission electron microscopic and shadowing techniques. Multilayered films containing regions free from UO/sub 2/ were prepared by evaporating or sputtering the material onto a carbon substrate, spraying with a suspension of polystyrene latex spheres, and shadow coating with UC/sub 2/ at an angle of 15 deg ; the regions behind the spheres contain no fissionable UO/sub 2/. Multilayered films consisting of UO/sub 2/-Pt-C and UO/sub 2/-ZrO/sub 2/-C layers were irradiated to a thermal neutron exposure of 2 x 10/sub 16/ nvt and then examined. For UC/sub 2/- Pt - C, perforated ridges were observed for the tracks in the UO/sub 2/-free regions. For UO/sub 2/ZrO/sub 2/-C, the tracks are more uriform and have a high electron transmission, but shadowing revealed nodular imperfections superimposed on the tracks. (D.L.C.)
Research Organization:
General Electric Co. Hanford Atomic Products Operation, Richland, Wash.
Sponsoring Organization:
USDOE
NSA Number:
NSA-15-009517
OSTI ID:
4097405
Report Number(s):
HW-SA-1951; 0021-8979
Journal Information:
Journal of Applied Physics (U.S.), Journal Name: Journal of Applied Physics (U.S.) Vol. Vol: 31; ISSN JAPIA
Country of Publication:
Country unknown/Code not available
Language:
English