FISSION FRAGMENT DAMAGE IN NONFISSIONABLE THIN FILMS
Journal Article
·
· Journal of Applied Physics (U.S.)
Fission fragment damage in thin films of nonfissionable materials was studied using Qansmission electron microscopic and shadowing techniques. Multilayered films containing regions free from UO/sub 2/ were prepared by evaporating or sputtering the material onto a carbon substrate, spraying with a suspension of polystyrene latex spheres, and shadow coating with UC/sub 2/ at an angle of 15 deg ; the regions behind the spheres contain no fissionable UO/sub 2/. Multilayered films consisting of UO/sub 2/-Pt-C and UO/sub 2/-ZrO/sub 2/-C layers were irradiated to a thermal neutron exposure of 2 x 10/sub 16/ nvt and then examined. For UC/sub 2/- Pt - C, perforated ridges were observed for the tracks in the UO/sub 2/-free regions. For UO/sub 2/ZrO/sub 2/-C, the tracks are more uriform and have a high electron transmission, but shadowing revealed nodular imperfections superimposed on the tracks. (D.L.C.)
- Research Organization:
- General Electric Co. Hanford Atomic Products Operation, Richland, Wash.
- Sponsoring Organization:
- USDOE
- NSA Number:
- NSA-15-009517
- OSTI ID:
- 4097405
- Report Number(s):
- HW-SA-1951; 0021-8979
- Journal Information:
- Journal of Applied Physics (U.S.), Journal Name: Journal of Applied Physics (U.S.) Vol. Vol: 31; ISSN JAPIA
- Country of Publication:
- Country unknown/Code not available
- Language:
- English
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