Xenon fluoride laser excitation by transverse electric discharge
Journal Article
·
· Appl. Phys. Lett., v. 28, no. 2, pp. 86-87
Stimulated emission has been produced in mixtures of He, NF$sub 3$, and Xe at total pressures between 300 and 1000 Torr. Laser emission was on lines at 3511 and 3531 A which have been associated with the excited XeF molecule. Excitation of the gas mixture was by a transverse electric discharge which produced pulses with peak currents of approximately 10$sup 4$ A and rise times of 20 ns. A maximum laser energy of 7 mJ was obtained from a gas mixture with a ratio of He:Xe:NF$sub 3$ of 98.0:1.5:0.5 at a total pressure of 300 Torr. (AIP)
- Research Organization:
- Science Applications Incorporated, Alexandria, Virginia 22202
- Sponsoring Organization:
- USDOE
- NSA Number:
- NSA-33-016989
- OSTI ID:
- 4095085
- Journal Information:
- Appl. Phys. Lett., v. 28, no. 2, pp. 86-87, Journal Name: Appl. Phys. Lett., v. 28, no. 2, pp. 86-87; ISSN APPLA
- Country of Publication:
- United States
- Language:
- English
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