Sputtering Ion Source for Solids
Journal Article
·
· Journal of Applied Physics
A new ion source for the analysis of solids was constructed. The ions are sputtered from the surface of the sample target by bombarding it with a concentrated beam of argon ions. The bombarding beam has an energy of 10 to 12 kv and an intensity of about 1 mamp. This large intensity produces a secondary beam of target ions of about 10⁻⁸ amp which is quite adequate for a routine analysis. In contrast to a spark source, the sputtering source gives very stable operation and allows electrometric recording of the mass spectrum. The mass spectra obtained are very simple and consist of peaks representing singly charged species. The source is not limited to metals or semiconductors, since good mass spectra were obtained from insulators. (auth)
- Research Organization:
- Geophysics Corp. of America, Bedford, Mass.
- Sponsoring Organization:
- USDOE
- NSA Number:
- NSA-18-010350
- OSTI ID:
- 4089735
- Journal Information:
- Journal of Applied Physics, Journal Name: Journal of Applied Physics Journal Issue: 9 Vol. 34; ISSN JAPIAU; ISSN 0021-8979
- Publisher:
- American Institute of Physics (AIP)
- Country of Publication:
- Country unknown/Code not available
- Language:
- English
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