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Electron-beam-controlled N$sub 2$ infrared laser

Journal Article · · J. Appl. Phys., v. 47, no. 1, pp. 376-377
OSTI ID:4085244

Laser action in N$sub 2$ on the first positive system (B$sup 3$Pi/subg/ $Yields$$A$$sup 3$$E$$sup +$/subu/) has been obtained in an electron-beam-controlled discharge. Pressures of up 200 Torr (limited by the sustainer voltage available) were used resulting in a maximum output of 30-kW 2-mJ pulses at an efficiency of 0.01%. The addition of a small amount (approx.1 Torr) of SF$sub 6$ resulted in a doubling of the output power and energy. (AIP)

Research Organization:
Electro-Physics Laboratory, Department of Electrical Engineering, University of Illinois, Urbana, Illinois 61801
NSA Number:
NSA-33-020077
OSTI ID:
4085244
Journal Information:
J. Appl. Phys., v. 47, no. 1, pp. 376-377, Journal Name: J. Appl. Phys., v. 47, no. 1, pp. 376-377; ISSN JAPIA
Country of Publication:
United States
Language:
English