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MASS SPECTROMETRIC STUDY OF NEUTRAL PARTICLES SPUTTERED FROM Cu BY 0- TO 100-ev Ar IONS

Journal Article · · Journal of Applied Physics (U.S.)
DOI:https://doi.org/10.1063/1.1713576· OSTI ID:4076211
A low-pressure magnetically confined argon arc discharge was used in a mass spectrometer ion source to study low-energy (0 to 100 ev) sputtering of polycrystalline copper. Target bombarding ion current densities ranged from 60 to 200 mu A/cm/sup 2/. Neutral particles were studied. Cu atoms and Cu/sub 2/ molecules were detected. The mass ratio of analyzed Cu/sub 2/ molecules to Cu atoms increased with bombarding ion energies to about 51/2% at ion energies of 100 ev. Target voltages for appearance of Cu atoms and Cu/sub 2/ molecules were - 19 and -50 v, respectively. No Cu/sub 3/ molecules were detected; if they were present, it was estimated that the ratio /sup 189/Cu/sub 3/ to Cu/sup 63/ is less than 0.09%. The method was found to be promising for the study of neutral particles in low-energy sputtering. Yield curves agree well with results of other observers; sensitivities of 7 x 10/sup -4/ atoms/ion were attained, and this figure can be improved. (auth)
Research Organization:
Univ. of Delaware, Newark
Sponsoring Organization:
USDOE
NSA Number:
NSA-18-014610
OSTI ID:
4076211
Journal Information:
Journal of Applied Physics (U.S.), Journal Name: Journal of Applied Physics (U.S.) Vol. Vol: 35; ISSN JAPIA
Country of Publication:
Country unknown/Code not available
Language:
English