Skip to main content
U.S. Department of Energy
Office of Scientific and Technical Information

Measurement and mapping of materials parameters for gallium arsenide wafers by infrared transmission topography

Conference ·
OSTI ID:405510
 [1]; ;  [2]
  1. Wright Labs., Wright-Patterson Air Force Base, OH (United States)
  2. Wright State Univ., Dayton, OH (United States)
Polished wafers of semiinsulating (SI) undoped GaAs or of doped conducting GaAs are important for manufacture of monolithic microwave integrated circuits or of junction light emitters. For SI wafers, the EL2 defect causes the SI state, and variation in EL2 density can cause on-wafer variations in device isolation and other device properties. With conducting materials, crystalline dislocations cause dark-line defects and other recombination centers that limit carrier lifetime in fabricated lasers. High free carrier concentration leads to low series resistance ohmic contacts and is very desirable in semiconductor lasers. In the process of evaluating these materials, we have found that infrared transmission measurements can provide dense data on device-pertinent materials parameters for correlation to device parameters. Our custom color maps of these materials parameters keyed to color histograms of the measurement data can provide informative presentations of very large data sets for comparison to device measurements. For example, we discuss nondestructive neutral and total EL2 density measurements in SI GaAs and nondestructive dislocation density and free carrier concentration measurements in GaAs: Si, both by infrared topography. When test devices can be fabricated at known positions on the materials evaluation wafer (or on a nearby wafer from the same boule), sensitive comparison of materials evaluation data to measured device performance can be achieved. We show that topographic color maps allow meaningful comparisons of the materials measurements to device measurements at different spacings.
OSTI ID:
405510
Report Number(s):
CONF-951231--
Country of Publication:
United States
Language:
English

Similar Records

Distributions of residual stress, dislocations, and EL2 in Czochralski-grown semi-insulating GaAs
Journal Article · Tue Jul 01 00:00:00 EDT 1986 · J. Appl. Phys.; (United States) · OSTI ID:5540801

Development and characterization of zone melt growth GaAs for gamma-ray detectors
Journal Article · Sat Jun 01 00:00:00 EDT 1996 · IEEE Transactions on Nuclear Science · OSTI ID:277673

EL2 distributions in vertical gradient freeze GaAs crystals
Journal Article · Wed Jun 15 00:00:00 EDT 1988 · J. Appl. Phys.; (United States) · OSTI ID:5254549