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Electron microscopy techniques for evaluating epitaxial and bulk III-V compound semiconductors

Conference ·
OSTI ID:405506
 [1]
  1. CNR-MASPEC Institute, Parma (Italy)
Electron microscopy is an important technique to study interfaces and microdefects in advanced III-V compound semiconductors. The paper briefly reviews some of the TEM methods used to this purpose and shows examples of their application to the characterization of epitaxial structures such as InGaAs/GaAs and GaAs/Ge as well as processed substrates like implanted InP.
OSTI ID:
405506
Report Number(s):
CONF-951231--
Country of Publication:
United States
Language:
English

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