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A CW duopigatron multiply-charged ion source

Conference · · IEEE Trans. Nucl. Sci., v. NS-23, no. 2, pp. 1084-1087
OSTI ID:4033031
A systematic study of the duopigatron has shown that this type of source is very convenient for the production of intense dc ion beams (greater than 10mA) of heavy elements with moderate charge states, if the operation and design parameters are properly matched. The charge state density distribution compares with the best results reported for dc duoplasmatrons, whereas the discharge power is less or equal. For argon, with a 0.8 kW power, the percentage of particles in the beam is: A$sup +$ equals 38, A$sup 2+$ equals 50.4, A$sup 3+$ equals 11, A$sup 4+$ = 0.5, A$sup 5+$ approximately equal to 0.1; the overall gas utilization factor being 80 percent if an insulating material (BN) is used for the anticathode and expansion cup construction. The total beam intensity is determined by the diameter of the hole bored on the axis of the anticathode electrode, and the ion current density in this plane is comparable to that at the anode plane of a duoplasmatron (approximately equal to 2 A/cm$sup 2$). The normalized emittance of the beam is E/sub N/ = 4 x 10$sup -7$ m x rd for a total beam intensity of 7.8 mA, which corresponds to an emissive hole of 0.8 mm diameter and a brightness of B/sub N/ approximately equal to 10$sup 10$ A$sup -2$/ sub xm/ xrd$sup -2$.
Research Organization:
Paris Univ., Orsay, France
NSA Number:
NSA-33-030461
OSTI ID:
4033031
Conference Information:
Journal Name: IEEE Trans. Nucl. Sci., v. NS-23, no. 2, pp. 1084-1087
Country of Publication:
United States
Language:
English