Emittance and brightness of multiply-charged ion beams from duopigatron and duoplasmatron sources
Conference
·
· IEEE Trans. Nucl. Sci., v. NS-23, no. 2, pp. 1088-1092
OSTI ID:4033008
The systematic study of the dependence of the charge state density distribution (CSDD) on the discharge parameters of both the duopigatron and the duoplasmatron sources was conducted. The experimental data show that for both sources the optimum conditions for multiply-charged ion production correspond to the operation of the discharge at points between two different modes. In particular, the pressure must be matched to a minimum value corresponding to the arc starvation mode. Under this condition the discharge exhibits large level fluctuations which are correlated with enlarged ion energy spreads. However, the instability level can (particularly in the duopigatron) be minimized by a proper choice of the magnetic field shape and magnetic field strength. In order to describe more completely the source performances, the emittance and brightness were measured under optimum conditions for production of multiply-charged ions in our design. Solutions were proposed to improve emittance and brightness by the adaptation of a plasma expansion cup. These solutions do not inversely affect the CSDD. The obtained performances are compared with other experiments.
- Research Organization:
- Paris Univ., Orsay, France
- NSA Number:
- NSA-33-030462
- OSTI ID:
- 4033008
- Conference Information:
- Journal Name: IEEE Trans. Nucl. Sci., v. NS-23, no. 2, pp. 1088-1092
- Country of Publication:
- United States
- Language:
- English
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Related Subjects
*ACCELERATORS-- PENNING ION SOURCES
*DUOPLASMATRONS-- BRIGHTNESS
*PENNING ION SOURCES-- BRIGHTNESS
430301* --Particle Accelerators--Auxiliaries & Components-- Ion Sources
MAGNETIC FIELDS
N54300* --Particle Accelerators--Ion Sources
Injection & Extraction
OPTIMIZATION
PERFORMANCE TESTING
PRESSURE DEPENDENCE
*DUOPLASMATRONS-- BRIGHTNESS
*PENNING ION SOURCES-- BRIGHTNESS
430301* --Particle Accelerators--Auxiliaries & Components-- Ion Sources
MAGNETIC FIELDS
N54300* --Particle Accelerators--Ion Sources
Injection & Extraction
OPTIMIZATION
PERFORMANCE TESTING
PRESSURE DEPENDENCE