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Synthesis and characterization of highly-conducting nitrogen-doped ultrananocrystalline diamond films

Journal Article · · Applied Physics Letters
DOI:https://doi.org/10.1063/1.1400761· OSTI ID:40277676
Ultrananocrystalline diamond (UNCD) films with up to 0.2% total nitrogen content were synthesized by a microwave plasma-enhanced chemical-vapor-deposition method using a CH{sub 4}(1%)/Ar gas mixture and 1%--20% nitrogen gas added. The electrical conductivity of the nitrogen-doped UNCD films increases by five orders of magnitude (up to 143 {Omega}-1 cm-1) with increasing nitrogen content. Conductivity and Hall measurements made as a function of film temperature down to 4.2 K indicate that these films have the highest n-type conductivity and carrier concentration demonstrated for phase-pure diamond thin films. Grain-boundary conduction is proposed to explain the remarkable transport properties of these films.
Research Organization:
Argonne National Laboratory (ANL), Argonne, IL
Sponsoring Organization:
(US)
DOE Contract Number:
W-31109-ENG-38
OSTI ID:
40277676
Journal Information:
Applied Physics Letters, Journal Name: Applied Physics Letters Journal Issue: 10 Vol. 79; ISSN 0003-6951
Publisher:
The American Physical Society
Country of Publication:
United States
Language:
English

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