Refractive-index change caused by electrons in amorphous AsS and AsSe thin films doped with different metals by photodiffusion

Journal Article · Wed Aug 01 00:00:00 EDT 2001 · Journal of the Optical Society of America B

DOI:https://doi.org/10.1364/JOSAB.18.001206· OSTI ID:40230819

Nordman, Olli; Nordman, Nina; Pashkevich, Valfrid

The refractive-index change caused by electrons was measured in amorphous AsS and AsSe thin films. Films were coated with different metals. Diffraction gratings were written by electron-beam lithography. The interactions of electrons in films with and without the photodiffusion of overcoated metal were compared. Incoming electrons caused metal atom and ion diffusion in both investigated cases. The metal diffusion was dependent on the metal and it was found to influence the refractive index. In some cases lateral diffusion of the metal was noticed. The conditions for applications were verified. {copyright} 2001 Optical Society of America

• Sponsoring Organization: (US)
• OSTI ID: 40230819
• Journal Information: Journal of the Optical Society of America B, Vol. 18, Issue 8; Other Information: Othernumber: JOBPDE000018000008001206000001; 007108JOB; PBD: Aug 2001; ISSN 0740-3224
• Publisher: The American Physical Society
• Country of Publication: United States
• Language: English

Related Subjects

71 CLASSICAL AND QUANTUM MECHANICS
GENERAL PHYSICS
ATOMS
DIFFRACTION GRATINGS
DIFFUSION
ELECTRONS
REFRACTIVE INDEX
THIN FILMS