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Defect clustering during ion irradiation of GaAs: Insight from molecular dynamics simulations

Journal Article · · Journal of Applied Physics
DOI:https://doi.org/10.1063/1.1384856· OSTI ID:40230486

Defect formation in compound semiconductors such as GaAs under ion irradiation is not as well understood as in Si and Ge. We show how a combination of ion range calculations and molecular dynamics computer simulations can be used to predict the atomic-level damage structures produced by MeV ions. The results show that the majority of damage produced in GaAs both by low-energy self-recoils and 6 MeV He ions is in clusters, and that a clear majority of the isolated defects are interstitials. Implications of the results for suggested applications are also discussed. {copyright} 2001 American Institute of Physics.

Sponsoring Organization:
(US)
OSTI ID:
40230486
Journal Information:
Journal of Applied Physics, Journal Name: Journal of Applied Physics Journal Issue: 4 Vol. 90; ISSN 0021-8979
Publisher:
The American Physical Society
Country of Publication:
United States
Language:
English

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