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Dimer-flipping-assisted diffusion on a Si(001) surface

Journal Article · · Applied Physics Letters
DOI:https://doi.org/10.1063/1.1336167· OSTI ID:40205334

The binding sites and diffusion pathways of Si adatoms on a c(4x2) reconstructed Si(001) surface are investigated by a tight-binding method with an environment-dependent silicon potential in conjunction with ab initio calculations using the Car--Parrinello method. A new diffusion pathway along the trough edge driven by dimer flipping is found with a barrier of 0.74 eV, comparable to that of 0.68 eV along the top of the dimer rows.

Sponsoring Organization:
(US)
OSTI ID:
40205334
Journal Information:
Applied Physics Letters, Journal Name: Applied Physics Letters Journal Issue: 25 Vol. 77; ISSN 0003-6951
Publisher:
The American Physical Society
Country of Publication:
United States
Language:
English

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