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Oxidation and phase transitions of epitaxial tin oxide thin films on ({bar 1}012) sapphire

Journal Article · · Journal of Applied Physics
DOI:https://doi.org/10.1063/1.1368865· OSTI ID:40203717
We studied the structural behavior and electrical transport properties of epitaxial {alpha}-SnO thin films grown on the ({bar 1}012){alpha}-Al{sub 2}O{sub 3} (sapphire) substrate. Hall effect measurements revealed that the epitaxial as-deposited SnO film is a p-type semiconductor. In situ x-ray diffraction studies show that the {alpha}-SnO phase is metastable and will transform into SnO{sub 2} with the rutile type structure when annealed at high temperatures in air. The onset of this phase transformation was observed to begin approximately at 300{degree}C during heating. Shortly thereafter, rutile SnO{sub 2} was observed to coexist with {alpha}-SnO and intermediate products such as Sn and Sn{sub 3}O{sub 4}. After being annealed at temperatures above 600{degree}C, the film then fully transformed into the rutile SnO{sub 2} phase. Our results show that the {alpha}-SnO to SnO{sub 2} structural transformation proceeds initially by the localized disproportionate redistribution of internal oxygen at low temperature, followed by the transformation of the remaining SnO phase and intermediate phases into SnO{sub 2} via the inward diffusion of external oxygen at higher temperatures. Most of the SnO{sub 2} crystallites nucleate epitaxially on {alpha}-SnO with the orientation relationship of (101){sub SnO{sub 2}}//(001){sub SnO} and their growth processes are controlled by the (101){sub SnO{sub 2}}//(001){sub SnO} interfaces, leading to a (101) texture and a laminar grain shape for SnO{sub 2}. The relationship between the electrical transport properties and the structural evolution of the film has also been investigated. {copyright} 2001 American Institute of Physics.
Sponsoring Organization:
(US)
OSTI ID:
40203717
Journal Information:
Journal of Applied Physics, Journal Name: Journal of Applied Physics Journal Issue: 11 Vol. 89; ISSN 0021-8979
Publisher:
The American Physical Society
Country of Publication:
United States
Language:
English

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