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Title: Microstructure of SrTiO{sub 3} thin films as single layer and incorporated in YBa{sub 2}Cu{sub 3}O{sub 7{minus}x}/SrTiO{sub 3} multilayers

Conference ·
OSTI ID:392183
;  [1]; ; ; ; ;  [2];  [3];  [2]
  1. Chalmers Univ. of Technology, Goeteborg (Sweden). Dept. of Physics
  2. Linkoeping Univ. (Sweden). Dept. of Physics
  3. National Defence Research Establishment, Linkoeping (Sweden)

Epitaxial single layer (001) SrTiO{sub 3} films and an epitaxial YBa{sub 2}Cu{sub 3}O{sub 7{minus}x}/SrTiO{sub 3} multilayer were dc and rf sputtered on (110){sub rhombohedral} LaAlO{sub 3} substrates. The microstructure of the films was characterized using transmission electron microscopy. The single layer SrTiO{sub 3} films exhibited different columnar morphologies. The column boundaries were due to the lattice mismatch between film and substrate. The boundaries were associated with interfacial dislocations at the film/substrate interface, where the dislocations relaxed the strain in the a,b plane. The columns consisted of individual subgrains. These subgrains were misoriented with respect to each other, with different in-plane orientations and different tilts of the (001) planes. The subgrain boundaries were antiphase or tilt boundaries. The individual layers of the YBa{sub 2}Cu{sub 3}O{sub 7{minus}x}/SrTiO{sub 3} multilayer were relatively uniform. A distortion of the SrTiO{sub 3} unit cell of 0.9% in the [001] direction and a Sr/Ti ratio of 0.62 {+-} 0.04 was observed, both in correspondence with the single layer SrTiO{sub 3} films. Areas with different tilt of the (001)-planes were also present, within each individual SrTiO{sub 3} layer.

OSTI ID:
392183
Report Number(s):
CONF-951155-; ISBN 1-55899-304-5; TRN: IM9647%%37
Resource Relation:
Conference: Fall meeting of the Materials Research Society (MRS), Boston, MA (United States), 27 Nov - 1 Dec 1995; Other Information: PBD: 1996; Related Information: Is Part Of Epitaxial oxide thin films 2; Speck, J.S. [ed.] [Univ. of California, Santa Barbara, CA (United States)]; Fork, D.K. [ed.] [Xerox Palo Alto Research Center, CA (United States)]; Wolf, R.M. [ed.] [Philips Research Labs., Briarcliff Manor, NY (United States)]; Shiosaki, Tadashi [ed.] [Kyoto Univ. (Japan)]; PB: 577 p.; Materials Research Society symposium proceedings, Volume 401
Country of Publication:
United States
Language:
English