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Why cryogenically cooled, thin crystals handle extremely high power densities

Journal Article · · Review of Scientific Instruments
DOI:https://doi.org/10.1063/1.1147459· OSTI ID:389540
; ;  [1]
  1. Materials Science Division, Argonne National Laboratory, Argonne IL 60439 (United States)
Recently, a new type of cryogenically cooled high heat load monochromator was proposed [Knapp {ital et} {ital al}., Rev. Sci. Instrum. {bold 65}, 2792 (1994)] and developed at Argonne National Laboratory [Knapp {ital et} {ital al}., Rev. Sci. Instrum. {bold 66}, 2138 (1995)] and tested [Rogers {ital et} {ital al}., Rev. Sci. Instrum. {bold 66}, 3494 (1995)] at the European Synchrotron Radiation Facility (ESRF). These tests showed that powers of 153 W and power densities of 450 W/mm{sup 2} cause only negligible strain. These powers and power densities are larger than will be absorbed by the first crystal on an undulator beamline at the Advanced Photon Source (APS). In our earlier work, we suggested that the crystal might show strain at much lower values of the powers and power densities. We now can explain the ESRF results in terms of the unique role the negative thermal expansion coefficient of Si plays in minimizing strain. {copyright} {ital 1996 American Institute of Physics.}
Research Organization:
Argonne National Laboratory (ANL), Argonne, IL
DOE Contract Number:
W-31109-ENG-38
OSTI ID:
389540
Report Number(s):
CONF-9510119--
Journal Information:
Review of Scientific Instruments, Journal Name: Review of Scientific Instruments Journal Issue: 9 Vol. 67; ISSN RSINAK; ISSN 0034-6748
Country of Publication:
United States
Language:
English