Investigation of glass polycapillaries for use in proximity x-ray lithography
- X-Ray Optical Systems, Inc., Albany, NY (United States)
- State Univ. of New York, Albany, NY (United States). Center for X-Ray Optics
Achieving the goals set by the US National Semiconductor Roadmap requires that sub 0.18 {micro}m design rules be incorporated into semiconductor device structures by the year 20001. A promising approach makes use of shorter wavelength radiation than is presently used in lithography, namely x rays. Arrays of glass fibers have the potential of controlling parameters important to point-source lithography including local divergence, global divergence, and field uniformity. The high absorption rate and scattering of x-rays in air at energies less than 3 keV necessitates that experiments must be conducted in an evacuated environment. Consequently, there has been little research on the transmission of x rays through glass polycapillary fibers at energies of 3 keV and lower. An experimental setup to test capillaries under such conditions has been developed at XOS. It has sufficiently long optical paths in the vacuum chamber to be useful in evaluating the parameters critical for semiconductor lithography. Experimental and simulated transmission characteristics of polycapillary fibers as well as a discussion on the feasibility of using them in a collimator for x-ray lithography are presented in this paper.
- OSTI ID:
- 379742
- Report Number(s):
- CONF-9507222--; ISBN 0-8194-1882-X
- Country of Publication:
- United States
- Language:
- English
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