High power excimer laser-generated plasma source for x-ray microlithography

Book · Sun Dec 31 04:00:00 EST 1995

OSTI ID:379736

Shields, H; Powers, M ^[1]; Turcu, I C.E.; Ross, I N ^[2]; Maldonado, J R ^[3]; Burkhalter, P G ^[4]; Newman, D A ^[5]

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1. JMAR Technology Co., San Diego, CA (United States)
2. Rutherford Appleton Lab., Chilton (United Kingdom)
3. IBM Microelectronics, Hopewell Junction, NY (United States)
4. Naval Research Lab., Washington, DC (United States)
5. SFA, Inc., Landover, MD (United States)

This paper describes a high-intensity, high pulse-repetition-rate picosecond-pulse excimer laser system and plasma x-ray source, which generates up to 3 W of average x-ray power, into 2{pi} steradians, in a spectral band from 10--16 {angstrom}. The XeCl excimer laser system output, at 308 nm, consists of a train of 16 pulses, each {approximately}45 ps in duration and spaced by 2 ns. The energy of each pulse in the train is {approximately}25 mJ, and the pulse-train repetition rate is 60 Hz. Each pulse in the train is focused to a spot of <10 {micro}m diameter on a metal tape target, resulting in an intensity of 1 {times} 10{sup 15} W cm{sup {minus}2}. Spectral and spatial characteristics of the x-ray emission have been studied, and the laser energy to x-ray dose conversion efficiency has been measured in an experiment which simulates the x-ray lithography process. Lithographic efficiencies of 5.9% and 10.9% have been measured for copper and stainless steel targets, respectively.

• OSTI ID: 379736
• Report Number(s): CONF-9507222--; ISBN 0-8194-1882-X
• Country of Publication: United States
• Language: English

Related Subjects

07 ISOTOPE AND RADIATION SOURCES
42 ENGINEERING
EXPERIMENTAL DATA
FABRICATION
INTEGRATED CIRCUITS
LASER-PRODUCED PLASMA
MASKING
PERFORMANCE
SCREEN PRINTING
X RADIATION
X-RAY SOURCES