Photoelectron emission microscopy and its application to the study of polymer surfaces
- and others
The X-ray Photoelectron Emission Microscopy (X-PEEM) at the Advanced Light Source (ALS) has a spatial resolution of 0.2 microns at an accelerating voltage of 12kV. The tunability of the photon energy is used to provide chemical state information using near edge X-ray absorption fine structure (NEXAFS) spectroscopy on the sub-micrometer scale. The homogeneity of thin films of polymer blends was studied for various film thicknesses. The polystyrene/polyvinylmethylether film of 194 {angstrom} showed protrusions of 2-3{mu}m diameter with an enriched polystyrene content while the polystyrene/polystyreneacrylonitrile 504 {angstrom} thick films showed 5-6 {mu}m segregated regions without any topological structure.
- Research Organization:
- Lawrence Berkeley Lab., Advanced Light Source, CA (US)
- Sponsoring Organization:
- USDOE, Washington, DC (US); Swiss National Science Foundation, Bern (Switzerland); Ministry of Education and Science (Spain) (US)
- DOE Contract Number:
- AC03-76SF00098
- OSTI ID:
- 379082
- Report Number(s):
- LBNL-38898; CONF-960520-2; LBNL/ALS-372; ON: DE96014939; TRN: US200210%%118
- Resource Relation:
- Conference: 3. international school and symposium on synchrotron radiation in natural science, Bielsko-Biala (PL), 05/31/1996--06/08/1996; Other Information: Supercedes report DE96014939; PBD: May 1996; PBD: 1 May 1996
- Country of Publication:
- United States
- Language:
- English
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