Photoelectron emission microscopy and its application to the study of polymer surfaces

Cossy-Favre, A; Diaz, J; Anders, S; Padmore, H A

Title: Photoelectron emission microscopy and its application to the study of polymer surfaces

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Abstract

The X-ray Photoelectron Emission Microscopy (X-PEEM) at the Advanced Light Source (ALS) has a spatial resolution of 0.2 microns at an accelerating voltage of 12kV. The tunability of the photon energy is used to provide chemical state information using near edge X-ray absorption fine structure (NEXAFS) spectroscopy on the sub-micrometer scale. The homogeneity of thin films of polymer blends was studied for various film thicknesses. The polystyrene/polyvinylmethylether film of 194 {angstrom} showed protrusions of 2-3{mu}m diameter with an enriched polystyrene content while the polystyrene/polystyreneacrylonitrile 504 {angstrom} thick films showed 5-6 {mu}m segregated regions without any topological structure.

Authors:

Cossy-Favre, A; Diaz, J; Anders, S; Padmore, H A ^[1]

and others

Publication Date:: Wed May 01 00:00:00 EDT 1996

Research Org.:: Lawrence Berkeley Lab., Advanced Light Source, CA (US)

Sponsoring Org.:: USDOE, Washington, DC (US); Swiss National Science Foundation, Bern (Switzerland); Ministry of Education and Science (Spain) (US)

OSTI Identifier:: 379082

Report Number(s):: LBNL-38898; CONF-960520-2; LBNL/ALS-372
ON: DE96014939; TRN: US200210%%118

DOE Contract Number:: AC03-76SF00098

Resource Type:: Conference

Resource Relation:: Conference: 3. international school and symposium on synchrotron radiation in natural science, Bielsko-Biala (PL), 05/31/1996--06/08/1996; Other Information: Supercedes report DE96014939; PBD: May 1996; PBD: 1 May 1996

Country of Publication:: United States

Language:: English

Subject:: 43 PARTICLE ACCELERATORS; 72 PHYSICS OF ELEMENTARY PARTICLES AND FIELDS; ADVANCED LIGHT SOURCE; CHEMICAL STATE; EDUCATIONAL FACILITIES; FINE STRUCTURE; MICROSCOPY; POLYMERS; SPATIAL RESOLUTION; SYNCHROTRON RADIATION; THIN FILMS; ADVANCED LIGHT SOURCE ALS

Citation Formats


                    Cossy-Favre, A, Diaz, J, Anders, S, and Padmore, H A. Photoelectron emission microscopy and its application to the study of polymer surfaces.  United States: N. p., 1996. 
        Web.

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                    Cossy-Favre, A, Diaz, J, Anders, S, & Padmore, H A. Photoelectron emission microscopy and its application to the study of polymer surfaces.  United States.

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                    Cossy-Favre, A, Diaz, J, Anders, S, and Padmore, H A. 1996.  
        "Photoelectron emission microscopy and its application to the study of polymer surfaces".  United States.  https://www.osti.gov/servlets/purl/379082.

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@article{osti_379082,

  title        = {Photoelectron emission microscopy and its application to the study of polymer surfaces},

  author       = {Cossy-Favre, A and Diaz, J and Anders, S and Padmore, H A},

  abstractNote = {The X-ray Photoelectron Emission Microscopy (X-PEEM) at the Advanced Light Source (ALS) has a spatial resolution of 0.2 microns at an accelerating voltage of 12kV. The tunability of the photon energy is used to provide chemical state information using near edge X-ray absorption fine structure (NEXAFS) spectroscopy on the sub-micrometer scale. The homogeneity of thin films of polymer blends was studied for various film thicknesses. The polystyrene/polyvinylmethylether film of 194 {angstrom} showed protrusions of 2-3{mu}m diameter with an enriched polystyrene content while the polystyrene/polystyreneacrylonitrile 504 {angstrom} thick films showed 5-6 {mu}m segregated regions without any topological structure.},

  doi          = {},

  url          = {https://www.osti.gov/biblio/379082},
  journal      = {},
number       = ,

  volume       = ,

  place        = {United States},

  year         = {Wed May 01 00:00:00 EDT 1996},

  month        = {Wed May 01 00:00:00 EDT 1996}

}

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