A study of filter transport mechanisms in filtered cathodic vacuum arcs

Journal Article · Sat Jun 01 04:00:00 EDT 1996 · IEEE Transactions on Plasma Science

DOI:https://doi.org/10.1109/27.533126· OSTI ID:377874

Bilek, M M.M. ^[1]; Yin, Y; McKenzie, D R ^[2]

---

1. Univ. of Cambridge (United Kingdom). Dept. of Engineering
2. Univ. of Sydney, New South Wales (Australia). Dept. of Applied Physics

Cathodic arc deposition in a well-established technique for depositing single element coatings including metals, carbon, and silicon. A wide range of multielement coatings may also be produced by reactive processes in which ions of the cathode material react with a background gas. Ion transport in a magnetically filtered cathodic arc thin film deposition system is investigated. The plasma floating potential, ion current and deposition rate profiles are used to show that the ion density profile is a function of the magnetic field configuration alone although the magnitude of the ion density increases linearly with magnetic field strength. The magnetic mirror effect, electron diffusion and ion centrifugal drift are identified as the dominant loss mechanisms. The results can be used to design optimal filter systems and to control deposition rate profiles. The effect of reactive gas pressure is also examined.

• OSTI ID: 377874
• Journal Information: IEEE Transactions on Plasma Science, Journal Name: IEEE Transactions on Plasma Science Journal Issue: 3 Vol. 24; ISSN ITPSBD; ISSN 0093-3813
• Country of Publication: United States
• Language: English

Related Subjects

36 MATERIALS SCIENCE
CARBON
CHARGED-PARTICLE TRANSPORT
ELECTRIC ARCS
ELECTRON DRIFT
EXPERIMENTAL DATA
MAGNETIC FILTERS
METALS
PLASMA DIAGNOSTICS
PLASMA POTENTIAL
PRESSURE DEPENDENCE
PROCESS CONTROL
SILICON
VACUUM COATING