A Hollow Cathode Magnetron (HCM)

Technical Report · Wed Apr 01 04:00:00 EST 1998

DOI:https://doi.org/10.2172/3757· OSTI ID:3757

Cohen, S A ^[1]; Wang, Z

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1. Princeton Plasma Physics Laboratory

A new type of plasma sputtering device, named the hollow cathode magnetron (HCM), has been developed by surrounding a planar magnetron cathode with a hollow cathode structure (HCS). Operating characteristics of HCMs, current-voltage ( I-V ) curves for fixed discharge pressure and voltage-pressure ( V-p ) curves for fixed cathode current, are measured. Such characteristics are compared with their planar magnetron counterparts. New operation regimes, such as substantially lower pressures (0.3 mTorr), were discovered for HCMs. Cathode erosion profiles show marked improvement over planar magnetron in terms of material utilization. The use of HCMs for thin film deposition are discussed.

• Research Organization: Princeton Plasma Physics Laboratory (PPPL), Princeton, NJ
• Sponsoring Organization: USDOE Office of Energy Research (ER)
• DOE Contract Number: AC02-76CH03073
• OSTI ID: 3757
• Report Number(s): PPPL-3294; ON: DE00003757
• Country of Publication: United States
• Language: English

Related Subjects

42 ENGINEERING
Cathode Sputtering
Deposition
Experimental Data
Hollow Cathodes
Magnetrons
Thin Films