Hollow cathode magnetron
Journal Article
·
· Journal of Vacuum Science and Technology, A
- Plasma Physics Laboratory, Princeton University, Princeton, New Jersey 08543 (United States)
A new type of plasma sputtering device, named the hollow cathode magnetron (HCM), has been developed by surrounding a planar magnetron cathode with a hollow cathode structure. Operating characteristics of HCMs, current{endash}voltage (I{endash}V) curves for fixed discharge pressure and voltage{endash}pressure (V{endash}p) curves for fixed cathode current, are measured. Such characteristics are compared with their planar magnetron counterparts. New operation regimes, such as substantially lower pressures (0.3 mTorr), were discovered for HCMs. Cathode erosion profiles show marked improvement over planar magnetron in terms of material utilization. The use of HCMs for thin film deposition are discussed. {copyright} {ital 1999 American Vacuum Society.}
- OSTI ID:
- 289217
- Journal Information:
- Journal of Vacuum Science and Technology, A, Journal Name: Journal of Vacuum Science and Technology, A Journal Issue: 1 Vol. 17; ISSN 0734-2101; ISSN JVTAD6
- Country of Publication:
- United States
- Language:
- English
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