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W and WSi{sub x} Ohmic contacts on {ital p}- and {ital n}-type GaN

Journal Article · · Journal of Vacuum Science and Technology, A
DOI:https://doi.org/10.1116/1.581799· OSTI ID:359783
 [1];  [2];  [1]; ;  [3];  [4];  [1]; ;  [5];  [6]
  1. Department of Materials Science and Engineering, University of Florida, Gainesville, Florida 32611 (United States)
  2. Department of Chemical Engineering, University of Florida, Gainesville, Florida 32611 (United States)
  3. Department of Materials Engineering, Technion--Israel Institute of Technology, Haifa 32000 (Israel)
  4. Office of Naval Research, Arlington, Virginia 22217 (United States)
  5. Sandia National Laboratories, Albuquerque, New Mexico 87185 (United States)
  6. Bell Laboratories, Lucent Technologies, Murray Hill, New Jersey 07974 (United States)

W and WSi Ohmic contacts on both {ital p}- and {ital n}-type GaN have been annealed at temperatures from 300 to 1000&hthinsp;{degree}C. There is minimal reaction ({le}100 {Angstrom} broadening of the metal/GaN interface) even at 1000&hthinsp;{degree}C. Specific contact resistances in the 10{sup {minus}5}&hthinsp;{Omega}&hthinsp;cm{sup 2} range are obtained for WSi{sub x} on Si-implanted GaN with a peak doping concentration of {approximately}5{times}10{sup 20}&hthinsp;cm{sup {minus}3}, after annealing at 950&hthinsp;{degree}C. On {ital p}-GaN, leaky Schottky diode behavior is observed for W, WSi{sub x} and Ni/Au contacts at room temperature, but true Ohmic characteristics are obtained at 250{endash}300&hthinsp;{degree}C, where the specific contact resistances are, typically, in the 10{sup {minus}2}&hthinsp;{Omega}&hthinsp;cm{sup 2} range. The best contacts for W and WSi{sub x} are obtained after 700&hthinsp;{degree}C annealing for periods of 30{endash}120 s. The formation of {beta}-W{sub 2}N interfacial phases appear to be important in determining the contact quality. {copyright} {ital 1999 American Vacuum Society.}

OSTI ID:
359783
Report Number(s):
CONF-981126--
Journal Information:
Journal of Vacuum Science and Technology, A, Journal Name: Journal of Vacuum Science and Technology, A Journal Issue: 4 Vol. 17; ISSN 0734-2101; ISSN JVTAD6
Country of Publication:
United States
Language:
English

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