Molecular beam epitaxy of Sb-based semiconductors
Technical Report
·
OSTI ID:339637
The growth of semiconductor antimonides by molecular beam epitaxy (MBE) was first reported in the late 1970`s. In recent years, the emergence of several potential device applications has resulted in increased activity in the field. Much of the work focuses on GaSb and AlSb because they are nearly lattice-matched to each other and to InAs (a{sub 0},AlSb = 6.1355 A, a{sub 0}, GaSb = 6.0954 A, a{sub 0}, InAs = 6.0584 A). These semiconductors are often referred to as the `6.1 A family.` Ternaries such as In{sub (x)}Ga{sub 1{minus}x}Sb, AlAs{sub x}Sb{sub 1{minus}x}, and GaAs{sub x}Sb{sub 1{minus}x} also have lattice constants close to 6.1 A if x is small. The interest in 6.1 A materials is based upon the wide range of available band alignments and band gaps. These are illustrated in a figure. For example, InAs is a small band gap semiconductor (e.g., 300K = 0.36 eV) with a small electron effective mass (m{sub e} = 0.023m{sub 0}) and large room-temperature mobility (30,000 sq cm/V-s). Hence, it is a candidate for the channel material in high-speed field-effect transistors (FETs). AlSb is an indirect-gap semiconductor with a large band gap (1.63 eV). The conduction band offset between AlSb and InAs is 1.35 eV, making AlSb a potential barrier material for FETs. A second example is InAs/GaSb. The band alignment is type-II, with the GaSb valence band lying above the InAs conduction band. Short-period superlattices formed with InAs and GaSb have small, tunable energy gaps and high absorption coefficients. Hence, they are candidates for long-wavelength infrared detectors.
- Research Organization:
- Naval Research Lab., Washington, DC (United States)
- OSTI ID:
- 339637
- Report Number(s):
- AD-A--357736/XAB
- Country of Publication:
- United States
- Language:
- English
Similar Records
Long-wavelength infrared detectors based on strained InAs--Ga/sub 1-//sub x/In/sub x/Sb type-II superlattices
Growth of {ital n}- and {ital p}-type Al(As)Sb by metalorganic chemical vapor deposition
Journal Article
·
Tue Feb 28 23:00:00 EST 1989
· J. Vac. Sci. Technol., A; (United States)
·
OSTI ID:6771031
Growth of {ital n}- and {ital p}-type Al(As)Sb by metalorganic chemical vapor deposition
Journal Article
·
Wed Jan 31 23:00:00 EST 1996
· Applied Physics Letters
·
OSTI ID:278623