The properties of a-Si:H/c-Si heterostructures prepared by 55 kHz PECVD for solar cell application
- Moscow Inst. of Electronic Technology (Russian Federation)
- UniSil Corp., Mountain View, CA (United States)
- Russian Academy of Sciences, Yaroslavl` (Russian Federation). Inst. of Microelectronics
- Univ. of Technology, Delft (Netherlands)
In this work a-Si:H/c-Si heterostructures with good electronic properties of a-Si:H were prepared by 55 kHz Plasma Enhanced Chemical Vapor Deposition (PECVD). Current-voltage and capacitance-voltage characteristics of a-Si:H/c-Si heterostructures were measured to investigate the influence of low frequency plasma on the growing film and amorphous silicon/crystalline silicon boundary. It was established that the interface state density is low enough for device applications (<2{center_dot}10{sup 10} cm{sup {minus}2}). The current voltage measurements suggest that, when forward biased, space-charge-limited current determines the transport mechanism in a-Si:H/c-Si heterostructures, while reverse current is ascribed to the generation current in a-Si:H and c-Si depletion layers.
- Sponsoring Organization:
- Nederlandse Centrale Organisatie voor Toegepast Natuurwetenschappelijk Onderzoek, The Hague (Netherlands)
- OSTI ID:
- 323679
- Report Number(s):
- CONF-971201-; TRN: IM9911%%293
- Resource Relation:
- Conference: 1997 fall meeting of the Materials Research Society, Boston, MA (United States), 1-5 Dec 1997; Other Information: PBD: 1998; Related Information: Is Part Of Thin-film structures for photovoltaics; Jones, E.D. [ed.] [Sandia National Labs., Albuquerque, NM (United States)]; Kalejs, J. [ed.] [ASE Americas Inc., Billerica, MA (United States)]; Noufi, R.; Sopori, B. [eds.] [National Renewable Energy Lab., Golden, CO (United States)]; PB: 325 p.; Materials Research Society symposium proceedings, Volume 485
- Country of Publication:
- United States
- Language:
- English
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