Ultra-hard crystalline {beta}-C{sub 3}N{sub 4} films synthesized using a reactive RF magnetron plasma source

Conference · Wed Dec 31 04:00:00 EST 1997

OSTI ID:323603

Xu, S; Ki, H S; Lee, S ^[1]; Li, Y A ^[2]

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1. Nanyang Technological Univ., Singapore (Singapore)
2. Chinese Academy of Sciences, Beijing (China). Inst. of Physics

Crystalline {beta}-C{sub 3}N{sub 4} was successfully synthesized on KBr(100), KCI(100), Si(100) and stainless steel substrates using a purpose-designed, high density, low temperature, RF Magnetron plasma source. The substrates were held at ambient temperature during deposition. The films were characterized using various analytical means. XRD, TEM and SEM analyses indicated that the films were of polycrystalline {beta}-C{sub 3}N{sub 4} with the biggest crystal grain of over 20 {micro}m. XPS and EDX results showed that the films were composed primarily of carbon and nitrogen. The measured interplanar spacings were in good agreement with the theoretical predictions. To the authors` knowledge, this is the first time crystalline {beta}-C{sub 3}N{sub 4} was successfully synthesized by means of reactive RF Magnetron sputtering technique.

• OSTI ID: 323603
• Report Number(s): CONF-970559--
• Country of Publication: United States
• Language: English

Related Subjects

36 MATERIALS SCIENCE
CARBON NITRIDES
MICROSTRUCTURE
POLYCRYSTALS
SPUTTERING
SUBSTRATES
SYNTHESIS