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Hydrogen-induced changes of the microscopic structure of microcrystalline silicon

Book ·
OSTI ID:308130
; ;  [1];  [2]
  1. Hahn-Meitner-Inst., Berlin (Germany)
  2. Bundesanstalt fuer Materialforschung und Materialpruefung, Berlin (Germany)
Microcrystalline silicon samples were exposed to an electron cyclotron resonance (ECR) hydrogen plasma at various exposure times and substrate temperatures. Before and after each post-hydrogenation treatment the crystalline fraction, X{sub c}, was determined from Raman backscattering spectra. The results reveal that the change of X{sub c} strongly depends on the structural composition of the starting material. Amorphous samples exhibit an increase of X{sub c} while for {micro}c-Si specimens the X{sub c} decreases. The decrease of X{sub c} is enhanced for specimens with a high initial crystalline fraction. The same plasma treatment of Si-wafers did not lead to amorphization. The authors conclude that the presence of lattice strain is required to observe a H-induced decrease of X{sub c}.
OSTI ID:
308130
Report Number(s):
CONF-980405--
Country of Publication:
United States
Language:
English