Interface stress and an apparent negative Poisson`s ratio in Ag/Ni multilayers

Book · Wed Dec 30 23:00:00 EST 1998

OSTI ID:305559

Schweitz, K O; Geisler, H; Chevallier, J; Boettiger, J ^[1]; Feidenhans`l, R ^[2]

---

1. Aarhus Univ. (Denmark). Inst. of Physics and Astronomy
2. Risoe National Lab., Roskilde (Denmark)

By use of dc-magnetron sputtering, (111) textured Ag/Ni multilayered thin films were deposited with nominal bilayer repeat lengths ranging from 2 nm to 250 nm. Bulk and interface stresses were obtained from X-ray diffraction and measurements of substrate curvatures. Both in-plane and out-of-plane expansions were observed in the Ni layers, and a compressive interface stress of {minus}2.24 {+-} 0.21 J/m{sup 2} was found. This is in agreement with a previously published result of the interface stress in Ag/Ni thin films which had, as opposed to the present multilayers, a high level of total stress.

• OSTI ID: 305559
• Report Number(s): CONF-971201--
• Country of Publication: United States
• Language: English

Related Subjects

36 MATERIALS SCIENCE
COMPOSITE MATERIALS
EXPERIMENTAL DATA
INTERFACES
LAYERS
NICKEL
SILVER
STRESS ANALYSIS
STRESSES
THIN FILMS