State-of-the-art X-ray photoelectron spectroscopy (XPS): Conventional and synchrotron x-ray sources for micro-XPS

Conference · Thu Dec 31 00:00:00 EST 1998

OSTI ID:302407

Principe, E L; Odom, R W ^[1]; Johnson, A L; Ackermann, G D; Hussain, Z; Padmore, H ^[2]

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1. Charles Evans and Associates, Redwood City, CA (United States)
2. Lawrence Berkeley National Lab., CA (United States). Advanced Light Source

This paper presents preliminary data on analyses of selected materials using two state-of-the-art XPS systems: the Physical Electronics Inc. (PHI, Eden Prairie, MN) Quantum 2000 instrument and the microXPS beamline (7.3.2.1) at the Advanced Light Source (ALS). This research compares and contrasts relevant performance characteristics of the two systems including elemental and chemical state detection sensitivity, imaging capabilities including lateral resolution and useful image fields, role of X-ray dose damage to surface, analysis speed as well as analytical throughput.

• OSTI ID: 302407
• Report Number(s): CONF-980405-; TRN: 99:002637
• Resource Relation: Conference: Spring meeting of the Materials Research Society, San Francisco, CA (United States), 13-17 Apr 1998; Other Information: PBD: 1998; Related Information: Is Part Of Applications of synchrotron radiation techniques to materials science 4; Mini, S.M. [ed.] [Northern Illinois Univ., DeKalb, IL (United States)]|[Argonne National Lab., IL (United States)]; Stock, S.R. [ed.] [Georgia Inst. of Tech., Atlanta, GA (United States)]; Perry, D.L. [ed.] [Lawrence Berkeley National Lab., CA (United States)]; Terminello, L.J. [ed.] [Lawrence Livermore National Lab., CA (United States)]; PB: 398 p.; Materials Research Society symposium proceedings, Volume 524
• Country of Publication: United States
• Language: English

Related Subjects

43 PARTICLE ACCELERATORS
40 CHEMISTRY
ELECTRON SPECTROMETERS
ADVANCED LIGHT SOURCE
ACCELERATOR FACILITIES
PERFORMANCE
COMPARATIVE EVALUATIONS
PHOTOELECTRON SPECTROSCOPY