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Fabrication of 4H-SiC Low Gain Avalanche Detectors (LGADs)

Journal Article · · Key Engineering Materials
DOI:https://doi.org/10.4028/p-0t5ifB· OSTI ID:3011014
 [1];  [1];  [2];  [1];  [1];  [2];  [3];  [2];  [1];  [1]
  1. North Carolina State University, Raleigh, NC (United States)
  2. Lawrence Berkeley National Laboratory (LBNL), Berkeley, CA (United States)
  3. Brookhaven National Laboratory (BNL), Upton, NY (United States)
Low gain avalanche detectors (LGADs) offer high temporal resolution for high energy particle detection, which is critical for next generation experiments in hadron colliders. While silicon LGADs (Si-LGADs) have rapidly matured in the last decade, research into silicon carbide (SiC) LGADs has only recently begun. By accounting for fundamental differences in material properties and fabrication processes, we present a prototype device design and process flow for 4H-SiC LGADs with etch-based isolation. Critical steps of the process flow and their results are discussed, including plasma etching, passivation, and the formation of low resistivity contacts. Electrical characterization (I-V, C-V) shows sufficient depletion of the device structure to demonstrate low-gain charge carrier multiplication.
Research Organization:
North Carolina State University, Raleigh, NC (United States)
Sponsoring Organization:
USDOE Office of Science (SC), High Energy Physics (HEP)
Grant/Contract Number:
SC0024252
OSTI ID:
3011014
Journal Information:
Key Engineering Materials, Journal Name: Key Engineering Materials Vol. 1024; ISSN 1662-9795
Publisher:
Trans Tech Publications, Ltd.Copyright Statement
Country of Publication:
United States
Language:
English

References (19)

ChemInform Abstract: Reactive Ion Etching of 6H‐SiC in SF6/O2 and CF4/O2 with N2 Additive for Device Fabrication. journal August 1996
Simultaneous Formation of Ni/Al Ohmic Contacts to Both n- and p-Type 4H-SiC journal August 2008
Simultaneous Formation of Ohmic Contacts on p +- and n +-4H-SiC Using a Ti/Ni Bilayer journal July 2013
Silicon dioxide and silicon nitride as a passivation and edge termination for 4H-SiC Schottky diodes journal March 2005
A critical review of theory and progress in Ohmic contacts to p-type SiC journal February 2020
Impact of Ar addition to inductively coupled plasma etching of SiC in SF6/O2 journal June 2004
Surface recombination velocities for 4H–SiC: Dependence of excited carrier concentration and surface passivation journal February 2024
Characterization of 4H-SiC Low Gain Avalanche Detectors (LGADs)
  • Yang, Tao; Sekely, Ben; Satapathy, Yashas
  • Nuclear Instruments and Methods in Physics Research Section A: Accelerators, Spectrometers, Detectors and Associated Equipment, Vol. 1082 https://doi.org/10.1016/j.nima.2025.170873
journal February 2026
Photo-Electric response of 4H-SiC APDs at High-Level incident flux journal July 2023
Deep SiC etching with RIE journal October 2006
4D tracking with ultra-fast silicon detectors journal December 2017
Spatial Non-Uniform Hot Carrier Luminescence From 4H-SiC p-i-n Avalanche Photodiodes journal March 2019
Electron, Neutron, and Proton Irradiation Effects on SiC Radiation Detectors journal December 2020
OHMIC CONTACTS TO SIC journal December 2005
Fabrication of Silicon Sensors Based on Low-Gain Avalanche Diodes journal April 2021
4H-SiC Schottky Barrier Diodes as Radiation Detectors: A Review journal February 2022
Ohmic Contacts on p-Type Al-Implanted 4H-SiC Layers after Different Post-Implantation Annealings journal October 2019
A Review: Inductively Coupled Plasma Reactive Ion Etching of Silicon Carbide journal December 2021
Effect of surface passivation on breakdown voltages of 4H-SiC Schottky barrier diodes journal July 2017

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Characterization of 4H-SiC Low Gain Avalanche Detectors (LGADs)
Journal Article · Sun Aug 10 20:00:00 EDT 2025 · Nuclear Instruments and Methods in Physics Research. Section A, Accelerators, Spectrometers, Detectors and Associated Equipment · OSTI ID:3011020